Publication:
Charge trapping and dielectric reliability of SiO2/AI2O3 gate stacks with TiN electrodes
Date
| dc.contributor.author | Kerber, Andreas | |
| dc.contributor.author | Cartier, Eduard | |
| dc.contributor.author | Degraeve, Robin | |
| dc.contributor.author | Roussel, Philippe | |
| dc.contributor.author | Pantisano, Luigi | |
| dc.contributor.author | Kauerauf, Thomas | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.author | Maes, Herman | |
| dc.contributor.author | Schwalke, U. | |
| dc.contributor.imecauthor | Degraeve, Robin | |
| dc.contributor.imecauthor | Roussel, Philippe | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.contributor.orcidimec | Roussel, Philippe::0000-0002-0402-8225 | |
| dc.date.accessioned | 2021-10-15T05:08:35Z | |
| dc.date.available | 2021-10-15T05:08:35Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7727 | |
| dc.source.beginpage | 1261 | |
| dc.source.endpage | 1269 | |
| dc.source.issue | 5 | |
| dc.source.journal | IEEE Trans. Electron Devices | |
| dc.source.volume | 50 | |
| dc.title | Charge trapping and dielectric reliability of SiO2/AI2O3 gate stacks with TiN electrodes | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |