Publication:

Low-Frequency Noise and Border Traps in Irradiated nMOS and pMOS Bulk Si FinFETs With SiO2/HfO2 Gate Dielectrics

Date

2023
Journal article
https://doi.org/10.1109/TNS.2023.3239844
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Author(s)

Li, Kan
;
Luo, Xuyi
;
Rony, M. W.
;
Gorchichko, Mariia
;
Hiblot, Gaspard  
;
Van Huylenbroeck, Stefaan  
;
Jourdain, Anne  
;
Alles, Michael L.
;
Reed, Robert A.
;
Zhang, En Xia
;
Fleetwood, Daniel M.
;
Schrimpf, Ronald D.

Journal

IEEE TRANSACTIONS ON NUCLEAR SCIENCE

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