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Processing assessment and adhesion evaluation of copper through-silicon vias (TSVs) for three-dimensional stacked-integrated circuit (3D-SIC) architectures
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Processing assessment and adhesion evaluation of copper through-silicon vias (TSVs) for three-dimensional stacked-integrated circuit (3D-SIC) architectures
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yang, Yu
;
Labie, Riet
;
Ling, Fangzhou
;
Zhao, Chao
;
Radisic, Alex
;
Van Olmen, Jan
;
Travaly, Youssef
;
Verlinden, Bert
;
De Wolf, Ingrid
Journal
Microelectronics Reliability
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1965
since deposited on 2021-10-19
2
last month
Acq. date: 2025-12-11
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Metrics
Views
1965
since deposited on 2021-10-19
2
last month
Acq. date: 2025-12-11
Citations