Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

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Author(s)

Fallica, Roberto

;

Huang, Weizhong

;

;

De Simone, Danilo

;

Guerrero, Douglas J.

;

Journal

Proceedings of SPIE

Metrics

960 since deposited on 2024-01-13

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Acq. date: 2025-10-29