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Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis
Publication:
Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis
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Date
2023
Proceedings Paper
https://doi.org/10.1117/12.2687546
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fallica, Roberto
;
Huang, Weizhong
;
Suh, Hyo Seon
;
De Simone, Danilo
;
Guerrero, Douglas J.
;
Kato, Kodai
Journal
Proceedings of SPIE
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962
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Acq. date: 2025-12-15
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Metrics
Views
962
since deposited on 2024-01-13
1
last month
Acq. date: 2025-12-15
Citations