Publication:

Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2687546
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dc.contributor.authorFallica, Roberto
dc.contributor.authorHuang, Weizhong
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorGuerrero, Douglas J.
dc.contributor.authorKato, Kodai
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorHuang, Weizhong
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2024-02-05T13:57:34Z
dc.date.available2024-01-13T17:47:50Z
dc.date.available2024-02-05T13:57:34Z
dc.date.embargo9999-12-31
dc.date.issued2023
dc.description.wosFundingTextWe are indebted to Gian Lorusso (imec) for fruitful discussions, Nadia Vandenbroeck (imec) for experimental support, and internship students Saika Bari (KIT), Steven Chen (KIT), and Muhammad Safdar (MUAS) for experimental work, data collection and analysis. R.F. acknowledges the Flemish Research Foundation (FWO) for co-financing the dissemination activity at SPIE PUV 2023 via grant #K108523N.
dc.identifier.doi10.1117/12.2687546
dc.identifier.eisbn978-1-5106-6749-5
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43405
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 27500I
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages4
dc.source.volume12750
dc.title

Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

dc.typeProceedings paper
dspace.entity.typePublication
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