Optimization of low-temperature silicon nitride processes for improvement of device performance

dc.contributor.author	Sleeckx, Erik
dc.contributor.author	Schaekers, Marc
dc.contributor.author	Shi, Xiaoping
dc.contributor.author	Kunnen, Eddy
dc.contributor.author	Degroote, Bart
dc.contributor.author	Jurczak, Gosia
dc.contributor.author	de Potter de ten Broeck, Muriel
dc.contributor.author	Augendre, Emmanuel
dc.contributor.imecauthor	Sleeckx, Erik
dc.contributor.imecauthor	Schaekers, Marc
dc.contributor.imecauthor	Jurczak, Gosia
dc.contributor.imecauthor	de Potter de ten Broeck, Muriel
dc.contributor.orcidimec	Sleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimec	Schaekers, Marc::0000-0002-1496-7816
dc.date.accessioned	2021-10-16T05:09:11Z
dc.date.available	2021-10-16T05:09:11Z
dc.date.issued	2005
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/11220
dc.source.beginpage	865
dc.source.endpage	868
dc.source.issue	5_6
dc.source.journal	Microelectronics Reliability
dc.source.volume	45
dc.title	Optimization of low-temperature silicon nitride processes for improvement of device performance
dc.type	Journal article
dspace.entity.type	Publication
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