Publication:

Electrical characteristics of Ge/GeOx(N)/HfO2 gate stacks

Date

 
dc.contributor.authorHoussa, Michel
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorAutran, J.L.
dc.contributor.authorStesmans, Andre
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-15T13:57:00Z
dc.date.available2021-10-15T13:57:00Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9065
dc.source.conference5th Symposium on SiO2, Advanced Dielectrics, and Related Devices
dc.source.conferencedate21/06/2004
dc.source.conferencelocationChamonix France
dc.title

Electrical characteristics of Ge/GeOx(N)/HfO2 gate stacks

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections: