Publication:

Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography

Date

2025-04-22

Proceedings Paper

https://doi.org/10.1117/12.3051547

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Author(s)

Miyaguchi, Kenichi

;

Kim, Ryan Ryoung Han

;

;

Drissi, Youssef

;

Chang, Chieh-Miao

;

;

Sherazi, Yasser

;

Trivkovic, Darko

;

Journal

Proceedings of SPIE

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40 since deposited on 2025-07-31

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Acq. date: 2026-04-26