Publication:

Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051547
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dc.contributor.authorMiyaguchi, Kenichi
dc.contributor.authorKim, Ryoung-Han
dc.contributor.authorOak, Apoorva
dc.contributor.authorDrissi, Youssef
dc.contributor.authorChang, Chieh-Miao
dc.contributor.authorLee, Jeonghoon
dc.contributor.authorSherazi, Yasser
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorLiu, Ru-Gun
dc.contributor.imecauthorMiyaguchi, Kenichi
dc.contributor.imecauthorKim, Ryoung-Han
dc.contributor.imecauthorOak, Apoorva
dc.contributor.imecauthorDrissi, Youssef
dc.contributor.imecauthorChang, Chieh-Miao
dc.contributor.imecauthorLee, Jeonghoon
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorLiu, Ru-Gun
dc.contributor.orcidimecMiyaguchi, Kenichi::0000-0002-7073-6457
dc.contributor.orcidimecOak, Apoorva::0000-0002-0926-848X
dc.contributor.orcidimecSherazi, Yasser::0000-0002-4076-8597
dc.contributor.orcidimecTrivkovic, Darko::0009-0003-7858-1802
dc.date.accessioned2025-07-31T04:00:02Z
dc.date.available2025-07-31T04:00:02Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051547
dc.identifier.eisbn978-1-5106-8637-3
dc.identifier.isbn978-1-5106-8636-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45986
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on DTCO and Computational Patterning
dc.source.conferencedateFEB 25-28, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages10
dc.source.volume13425
dc.title

Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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