Publication:

Patterning challenges for direct metal etch of ruthenium and molybdenum at 32 nm metal pitch and below

Date

2022-04-26
Journal article
https://doi.org/10.1116/6.0001791
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Published version 6.92 MB

Author(s)

Decoster, Stefan  
;
Camerotto, Elisabeth
;
Murdoch, Gayle  
;
Kundu, Souvik  
;
Jurczak, Gosia
;
Le, Quoc Toan  
;
Tokei, Zsolt  
;
Lazzarino, Frederic  

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

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480 since deposited on 2022-05-22
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1885 since deposited on 2022-05-22
4last month
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Acq. date: 2026-05-16

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