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Patterning challenges for direct metal etch of ruthenium and molybdenum at 32 nm metal pitch and below
Publication:
Patterning challenges for direct metal etch of ruthenium and molybdenum at 32 nm metal pitch and below
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Date
2022-04-26
Journal article
https://doi.org/10.1116/6.0001791
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Decoster, Stefan
;
Camerotto, Elisabeth
;
Murdoch, Gayle
;
Kundu, Souvik
;
Jurczak, Gosia
;
Le, Quoc Toan
;
Tokei, Zsolt
;
Lazzarino, Frederic
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
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268
since deposited on 2022-05-22
33
last month
8
last week
Acq. date: 2025-12-15
Views
1871
since deposited on 2022-05-22
4
last month
Acq. date: 2025-12-15
Citations