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Comparative growth kinetics of SiGe in a commercial reduced pressure chemical vapour deposition EPI reactor and anomalies during growth of thin Si layers on SiGe
Publication:
Comparative growth kinetics of SiGe in a commercial reduced pressure chemical vapour deposition EPI reactor and anomalies during growth of thin Si layers on SiGe
Date
1998
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Caymax, Matty
;
Loo, Roger
;
Brijs, Bert
;
Vandervorst, Wilfried
;
Howard, Dave
;
Kimura, K.
;
Nakajima, K.
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1924
since deposited on 2021-09-30
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Acq. date: 2025-12-08
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1924
since deposited on 2021-09-30
1
last month
Acq. date: 2025-12-08
Citations