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Advances in process optimization for dual-tone development as a double patterning technique
Publication:
Advances in process optimization for dual-tone development as a double patterning technique
Date
2008
Proceedings Paper
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16968.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fonseca, Carlos
;
Somervell, Mark
;
Bernard, Sophie
;
Hatakeyama, Shinichi
;
Nafus, Kathleen
;
Leeson, Michael
;
Scheer, Steven
;
Gronheid, Roel
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1916
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1916
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations