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Advances in process optimization for dual-tone development as a double patterning technique

Date

2008
Proceedings Paper
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dc.contributor.authorFonseca, Carlos
dc.contributor.authorSomervell, Mark
dc.contributor.authorBernard, Sophie
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorLeeson, Michael
dc.contributor.authorScheer, Steven
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-17T07:08:30Z
dc.date.available2021-10-17T07:08:30Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13735
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
dc.title

Advances in process optimization for dual-tone development as a double patterning technique

dc.typeProceedings paper
dspace.entity.typePublication
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