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Impact of work function metal stacks on the performance and reliability of multi-Vth RMG CMOS technology
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Impact of work function metal stacks on the performance and reliability of multi-Vth RMG CMOS technology
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Date
2024
Journal article
https://doi.org/10.1016/j.sse.2024.108929
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franco, Jacopo
;
Arimura, Hiroaki
;
Brus, Stephan
;
Dentoni Litta, Eugenio
;
Croes, Kristof
;
Horiguchi, Naoto
;
Kaczer, Ben
Journal
SOLID-STATE ELECTRONICS
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2
since deposited on 2024-05-24
Acq. date: 2025-12-15
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538
since deposited on 2024-05-24
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last month
Acq. date: 2025-12-15
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Metrics
Downloads
2
since deposited on 2024-05-24
Acq. date: 2025-12-15
Views
538
since deposited on 2024-05-24
2
last month
Acq. date: 2025-12-15
Citations