Charging of submicron structures during silicon dioxide etching in one

Publication:

2010

Journal article

Author(s)

Palov, P.A.

;

Mankelevich, Yu. A.

;

Rakhimova, T. V.

;

Shamiryan, Denis

Plasma Physics Reports

1831 since deposited on 2021-10-18

1last month

Acq. date: 2026-08-29