Publication:
Charging of submicron structures during silicon dioxide etching in one
Date
| dc.contributor.author | Palov, P.A. | |
| dc.contributor.author | Mankelevich, Yu. A. | |
| dc.contributor.author | Rakhimova, T. V. | |
| dc.contributor.author | Shamiryan, Denis | |
| dc.date.accessioned | 2021-10-18T19:59:48Z | |
| dc.date.available | 2021-10-18T19:59:48Z | |
| dc.date.issued | 2010 | |
| dc.identifier.issn | 1063-780X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/17758 | |
| dc.source.beginpage | 891 | |
| dc.source.endpage | 901 | |
| dc.source.issue | 10 | |
| dc.source.journal | Plasma Physics Reports | |
| dc.source.volume | 36 | |
| dc.title | Charging of submicron structures during silicon dioxide etching in one | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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