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Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applications
Publication:
Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applications
Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Loo, Roger
;
Verheyen, Peter
;
Eneman, Geert
;
Rooyackers, Rita
;
Leys, Frederik
;
Shamiryan, Denis
;
De Meyer, Kristin
;
Absil, Philippe
;
Caymax, Matty
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1895
since deposited on 2021-10-16
Acq. date: 2025-10-22
Citations
Metrics
Views
1895
since deposited on 2021-10-16
Acq. date: 2025-10-22
Citations