Publication:

Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applications

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1900 since deposited on 2021-10-16
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Acq. date: 2026-01-09

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1900 since deposited on 2021-10-16
2last month
2last week
Acq. date: 2026-01-09

Citations