Publication:

Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applications

Date

2005
Proceedings Paper
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dc.contributor.authorLoo, Roger
dc.contributor.authorVerheyen, Peter
dc.contributor.authorEneman, Geert
dc.contributor.authorRooyackers, Rita
dc.contributor.authorLeys, Frederik
dc.contributor.authorShamiryan, Denis
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorAbsil, Philippe
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecVerheyen, Peter::0000-0002-8245-9442
dc.date.accessioned2021-10-16T03:02:42Z
dc.date.available2021-10-16T03:02:42Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10803
dc.source.conferenceASM Users Meeting
dc.source.conferencedate29/09/2005
dc.source.conferencelocationMünchen Germany
dc.title

Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applications

dc.typeProceedings paper
dspace.entity.typePublication
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