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A 0.35μm SiGe BiCMOS process featuring a 80 GHz Fmax HBT and integrated high-Q RF passive components
Publication:
A 0.35μm SiGe BiCMOS process featuring a 80 GHz Fmax HBT and integrated high-Q RF passive components
Date
2000
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Decoutere, Stefaan
;
Vleugels, Frank
;
Kuhn, Rudiger
;
Loo, Roger
;
Caymax, Matty
;
Jenei, Snezana
;
Croon, Jeroen
;
Van Huylenbroeck, Stefaan
;
Da Rold, Martina
;
Rosseel, Erik
;
Chevalier, P.
;
Coppens, P.
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3
since deposited on 2021-10-14
Acq. date: 2025-10-23
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2202
since deposited on 2021-10-14
Acq. date: 2025-10-23
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Downloads
3
since deposited on 2021-10-14
Acq. date: 2025-10-23
Views
2202
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations