Publication:

Thickness dependent residual stress in sputtered AlN thin films

Date

2012
Journal article
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dc.contributor.authorPobedinskas, Paulius
dc.contributor.authorBolsée, J.C.
dc.contributor.authorDexters, W.
dc.contributor.authorRuttens, Bart
dc.contributor.authorMortet, Vincent
dc.contributor.authorD'Haen, Jan
dc.contributor.authorManca, Jean
dc.contributor.authorHaenen, Ken
dc.contributor.imecauthorPobedinskas, Paulius
dc.contributor.imecauthorRuttens, Bart
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecPobedinskas, Paulius::0000-0001-8136-5172
dc.contributor.orcidimecRuttens, Bart::0000-0002-9116-6502
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.date.accessioned2021-10-20T14:39:58Z
dc.date.available2021-10-20T14:39:58Z
dc.date.issued2012
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21313
dc.source.beginpage180
dc.source.endpage185
dc.source.journalThin Solid Films
dc.source.volume522
dc.title

Thickness dependent residual stress in sputtered AlN thin films

dc.typeJournal article
dspace.entity.typePublication
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