Publication:

Single element and metal alloy novel EUV mask absorbers for improved imaging

Date

2017
Proceedings Paper
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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorSouriau, Laurent
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorHendrickx, Eric
dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.contributor.authorKruemberg, Jens
dc.contributor.authorReuter, Christian
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-24T10:57:55Z
dc.date.available2021-10-24T10:57:55Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29170
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10450/104500G/Single-element-and-metal-alloy-novel-EUV-mask-ab
dc.source.beginpage104500G
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithpgraphy - EUVL
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

Single element and metal alloy novel EUV mask absorbers for improved imaging

dc.typeProceedings paper
dspace.entity.typePublication
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