Publication:

Selective single-wafer wet etching of Hf-based layers

Date

2005
Journal article
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dc.contributor.authorSnow, Jim
dc.contributor.authorKraus, Harald
dc.contributor.authorKovacs, Fredi
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorArcher, Leo
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T05:18:11Z
dc.date.available2021-10-16T05:18:11Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11249
dc.source.beginpage115
dc.source.endpage120
dc.source.issue28
dc.source.journalSemiconductor Fabtech
dc.title

Selective single-wafer wet etching of Hf-based layers

dc.typeJournal article
dspace.entity.typePublication
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