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Effect of Al-content and post deposition annealing on the electrical properties of ultra-thin HfAlxOy layers
Publication:
Effect of Al-content and post deposition annealing on the electrical properties of ultra-thin HfAlxOy layers
Date
2003
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Carter, Richard
;
Tsai, Wilman
;
Young, Edward
;
Maes, Jan
;
Chen, P.J.
;
Delabie, Annelies
;
Zhao, Chao
;
De Gendt, Stefan
;
Heyns, Marc
Journal
Abstract
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1988
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2025-12-08
Citations
Metrics
Views
1988
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2025-12-08
Citations