In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

dc.contributor.author	Dendooven, Jolien
dc.contributor.author	Devloo-Casier, Kilian
dc.contributor.author	Levrau, Elisabeth
dc.contributor.author	Van Hove, Robbert
dc.contributor.author	Pulinthanathu Sree, Sreeprasanth
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	Martens, Johan
dc.contributor.author	Detavernier, Christophe
dc.contributor.imecauthor	Levrau, Elisabeth
dc.date.accessioned	2021-10-20T10:39:16Z
dc.date.available	2021-10-20T10:39:16Z
dc.date.embargo	9999-12-31
dc.date.issued	2012
dc.identifier.issn	0743-7463
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/20585
dc.source.beginpage	3852
dc.source.endpage	3859
dc.source.issue	8
dc.source.journal	Langmuir
dc.source.volume	28
dc.title	In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry
dc.type	Journal article
dspace.entity.type	Publication
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