Publication:

Opportunities and challenges in APT metrology for semiconductor applications

Date

2019
Journal article
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dc.contributor.authorFleischmann, Claudia
dc.contributor.authorCuduvally, Ramya
dc.contributor.authorMorris, Richard
dc.contributor.authorMelkonyan, Davit
dc.contributor.authorOp de Beeck, Jonathan
dc.contributor.authorMakhotkin, Igor
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorCuduvally, Ramya
dc.contributor.imecauthorMorris, Richard
dc.contributor.imecauthorOp de Beeck, Jonathan
dc.contributor.imecauthorMakhotkin, Igor
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecMorris, Richard::0000-0002-0902-7088
dc.contributor.orcidimecOp de Beeck, Jonathan::0000-0003-3471-2156
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.accessioned2021-10-27T09:15:30Z
dc.date.available2021-10-27T09:15:30Z
dc.date.issued2019
dc.identifier.issn1431-9276
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32969
dc.identifier.urlhttps://doi.org/10.1017/S1431927619002290
dc.source.beginpage312
dc.source.issueSuppl. 2
dc.source.journalMicroscopy and Microanalysis
dc.source.volume25
dc.title

Opportunities and challenges in APT metrology for semiconductor applications

dc.typeJournal article
dspace.entity.typePublication
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