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Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications
Publication:
Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications
Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vertommen, Johan
;
Klippert, W.
;
Goethals, Mieke
;
Van Roey, Frieda
Journal
J. Photopolymer Science and Technology
Abstract
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1963
since deposited on 2021-10-01
Acq. date: 2025-10-22
Citations
Metrics
Views
1963
since deposited on 2021-10-01
Acq. date: 2025-10-22
Citations