Publication:
Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications
Date
| dc.contributor.author | Vertommen, Johan | |
| dc.contributor.author | Klippert, W. | |
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Van Roey, Frieda | |
| dc.contributor.imecauthor | Van Roey, Frieda | |
| dc.date.accessioned | 2021-10-01T09:40:29Z | |
| dc.date.available | 2021-10-01T09:40:29Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3129 | |
| dc.source.beginpage | 597 | |
| dc.source.endpage | 612 | |
| dc.source.issue | 4 | |
| dc.source.journal | J. Photopolymer Science and Technology | |
| dc.source.volume | 11 | |
| dc.title | Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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