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Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma
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Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Urbanowicz, Adam
;
Cremel, Maxime
;
Vanstreels, Kris
;
Shamiryan, Denis
;
De Gendt, Stefan
;
Baklanov, Mikhaïl
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1837
since deposited on 2021-10-18
Acq. date: 2025-12-11
Citations
Metrics
Views
1837
since deposited on 2021-10-18
Acq. date: 2025-12-11
Citations