Publication:

Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma

Date

2010
Meeting abstract
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dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorCremel, Maxime
dc.contributor.authorVanstreels, Kris
dc.contributor.authorShamiryan, Denis
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-18T22:33:40Z
dc.date.available2021-10-18T22:33:40Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18114
dc.source.conference3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate4/03/2010
dc.source.conferencelocationGrenoble France
dc.title

Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma

dc.typeMeeting abstract
dspace.entity.typePublication
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