Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method

dc.contributor.author	Vesters, Yannick
dc.contributor.author	Shehzad, Atif
dc.contributor.author	De Simone, Danilo
dc.contributor.author	Pollentier, Ivan
dc.contributor.author	Nannarone, Stefano
dc.contributor.author	Vandenberghe, Geert
dc.contributor.author	De Gendt, Stefan
dc.contributor.imecauthor	De Simone, Danilo
dc.contributor.imecauthor	Pollentier, Ivan
dc.contributor.imecauthor	Vandenberghe, Geert
dc.contributor.imecauthor	De Gendt, Stefan
dc.contributor.orcidimec	De Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimec	Pollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimec	De Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned	2021-10-27T22:51:23Z
dc.date.available	2021-10-27T22:51:23Z
dc.date.embargo	9999-12-31
dc.date.issued	2019
dc.identifier.issn	0914-9244
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/34390
dc.identifier.url	https://doi.org/10.2494/photopolymer.32.57
dc.source.beginpage	57
dc.source.endpage	66
dc.source.issue	1
dc.source.journal	Journal of Photopolymer Science and Technology
dc.source.volume	32
dc.title	Photoresist absorption measurement at extreme ultraviolet (EUV) wavelength by thin film transmission method
dc.type	Journal article
dspace.entity.type	Publication
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