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Impact of the gate-electrode/dielectric interface on the low-frequency noise of thin gate oxide n-channel metal-oxide-semiconductor field-effect transistors
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Impact of the gate-electrode/dielectric interface on the low-frequency noise of thin gate oxide n-channel metal-oxide-semiconductor field-effect transistors
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Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Claeys, Cor
;
Simoen, Eddy
;
Srinivasan, Purushothaman
;
Misra, D.
Journal
Solid-State Electronics
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1840
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Acq. date: 2025-12-10
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Metrics
Views
1840
since deposited on 2021-10-16
3
last month
Acq. date: 2025-12-10
Citations