Publication:
Gate oxide reliability: upcoming trends, challenges, and opportunities
| dc.contributor.author | Kaczer, Ben | |
| dc.contributor.author | Degraeve, Robin | |
| dc.contributor.author | Franco, Jacopo | |
| dc.contributor.author | Grasser, T. | |
| dc.contributor.author | Roussel, Philippe | |
| dc.contributor.author | Bury, Erik | |
| dc.contributor.author | Weckx, Pieter | |
| dc.contributor.author | Vaisman Chasin, Adrian | |
| dc.contributor.author | Tyaginov, Stanislav | |
| dc.contributor.author | Vandemaele, Michiel | |
| dc.contributor.author | Grill, Alexander | |
| dc.contributor.author | O'Sullivan, Barry | |
| dc.contributor.author | Diaz Fortuny, Javier | |
| dc.contributor.author | Saraza Canflanca, Pablo | |
| dc.contributor.author | Waltl, M. | |
| dc.contributor.author | Rinaudo, Pietro | |
| dc.contributor.author | Zhao, Ying | |
| dc.contributor.author | Kao, Ethan | |
| dc.contributor.author | Asanovski, Ruben | |
| dc.contributor.author | Catapano, Edoardo | |
| dc.contributor.imecauthor | Kaczer, B. | |
| dc.contributor.imecauthor | Degraeve, R. | |
| dc.contributor.imecauthor | Franco, J. | |
| dc.contributor.imecauthor | Roussel, Ph J. | |
| dc.contributor.imecauthor | Bury, E. | |
| dc.contributor.imecauthor | Weckx, P. | |
| dc.contributor.imecauthor | Chasin, A. | |
| dc.contributor.imecauthor | Tyaginov, S. | |
| dc.contributor.imecauthor | Vanclemacle, M. | |
| dc.contributor.imecauthor | Grill, A. | |
| dc.contributor.imecauthor | O'Sullivan, B. | |
| dc.contributor.imecauthor | Fortuny, J. Diaz | |
| dc.contributor.imecauthor | Canflanca, P. Saraza | |
| dc.contributor.imecauthor | Rinaudo, P. | |
| dc.contributor.imecauthor | Zhao, Y. | |
| dc.contributor.imecauthor | Kao, E. | |
| dc.contributor.imecauthor | Asanovski, R. | |
| dc.contributor.imecauthor | Catapano, E. | |
| dc.contributor.imecauthor | Beckers, A. | |
| dc.contributor.imecauthor | Vici, A. | |
| dc.date.accessioned | 2024-10-27T16:53:00Z | |
| dc.date.available | 2024-10-27T16:53:00Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1109/SNW63608.2024.10639245 | |
| dc.identifier.eisbn | 979-8-3503-9163-3 | |
| dc.identifier.isbn | 979-8-3503-9164-0 | |
| dc.identifier.issn | 2161-4636 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44693 | |
| dc.publisher | IEEE | |
| dc.source.beginpage | 3 | |
| dc.source.conference | IEEE Silicon Nanoelectronics Workshop (SNW) / Symposium on VLSI Technology and Circuits | |
| dc.source.conferencedate | 2024-06-15 | |
| dc.source.conferencelocation | Honolulu | |
| dc.source.endpage | 4 | |
| dc.source.numberofpages | 2 | |
| dc.title | Gate oxide reliability: upcoming trends, challenges, and opportunities | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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