Publication:

Gate oxide reliability: upcoming trends, challenges, and opportunities

Date

2024
Proceedings Paper
https://doi.org/10.1109/SNW63608.2024.10639245
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-0402-8225
cris.virtual.orcid0000-0002-8186-071X
cris.virtual.orcid0000-0003-2155-8305
cris.virtual.orcid0000-0002-5348-2096
cris.virtual.orcid0000-0002-7382-8605
cris.virtual.orcid0000-0002-5847-3949
cris.virtual.orcid0000-0002-9036-8241
cris.virtual.orcid0000-0001-7676-1306
cris.virtual.orcid0000-0002-9940-0260
cris.virtual.orcid0000-0002-4609-5573
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-1615-1033
cris.virtual.orcid0000-0002-1484-4007
cris.virtual.orcid0000-0003-0740-4115
cris.virtual.orcid0000-0002-4044-9975
cris.virtual.orcid0009-0007-8427-9318
cris.virtual.orcid0000-0002-2288-1414
cris.virtual.orcid0000-0002-7758-5655
cris.virtual.orcid0000-0001-6121-0069
cris.virtual.orcid0000-0003-1662-585X
cris.virtualsource.departmentf2e648b4-91e6-42de-bb5d-66326414095e
cris.virtualsource.department0328af28-0868-452b-9c77-facda8733c82
cris.virtualsource.department060412a0-f333-4964-b692-f1ab550c24c1
cris.virtualsource.departmentf3759903-e615-46a5-8efa-11f3aef05ef3
cris.virtualsource.department54f24b6a-b745-4c59-a5bc-058756e94864
cris.virtualsource.department037e6881-9aff-485e-9d58-d5383949642f
cris.virtualsource.departmentb5b8437b-a909-4ee5-812e-0ce57bfdeaaf
cris.virtualsource.departmentf6257b17-b70f-4f55-9fa8-895d4e3d49fd
cris.virtualsource.department8fc98104-5797-4ad7-ab96-253e6c50458d
cris.virtualsource.department8b84673b-878f-4c3b-959d-b7cdae2d70d9
cris.virtualsource.departmentde93b028-9708-4f3a-99f0-5edbf35f1ef2
cris.virtualsource.departmentf5422aad-241b-410a-a7b7-28bf124c06e0
cris.virtualsource.department812f2909-a81b-4593-9b32-75331cffa35c
cris.virtualsource.departmentb5aff799-14ab-40d3-b92b-31835476c27d
cris.virtualsource.department9cdfd845-a587-4e78-bf30-cdddaec01290
cris.virtualsource.department56ec315a-bc87-4cd9-9780-c53663438329
cris.virtualsource.department3dd0101d-ea52-4d2e-ba2a-b54570eb9d6e
cris.virtualsource.department052e01d3-a9e0-4b32-966f-8ecafe5ef49d
cris.virtualsource.department89a91aff-dba9-4deb-bc4c-d5206f2f4e17
cris.virtualsource.departmentdd107ae4-7e5b-4146-a52c-2b865393d830
cris.virtualsource.orcidf2e648b4-91e6-42de-bb5d-66326414095e
cris.virtualsource.orcid0328af28-0868-452b-9c77-facda8733c82
cris.virtualsource.orcid060412a0-f333-4964-b692-f1ab550c24c1
cris.virtualsource.orcidf3759903-e615-46a5-8efa-11f3aef05ef3
cris.virtualsource.orcid54f24b6a-b745-4c59-a5bc-058756e94864
cris.virtualsource.orcid037e6881-9aff-485e-9d58-d5383949642f
cris.virtualsource.orcidb5b8437b-a909-4ee5-812e-0ce57bfdeaaf
cris.virtualsource.orcidf6257b17-b70f-4f55-9fa8-895d4e3d49fd
cris.virtualsource.orcid8fc98104-5797-4ad7-ab96-253e6c50458d
cris.virtualsource.orcid8b84673b-878f-4c3b-959d-b7cdae2d70d9
cris.virtualsource.orcidde93b028-9708-4f3a-99f0-5edbf35f1ef2
cris.virtualsource.orcidf5422aad-241b-410a-a7b7-28bf124c06e0
cris.virtualsource.orcid812f2909-a81b-4593-9b32-75331cffa35c
cris.virtualsource.orcidb5aff799-14ab-40d3-b92b-31835476c27d
cris.virtualsource.orcid9cdfd845-a587-4e78-bf30-cdddaec01290
cris.virtualsource.orcid56ec315a-bc87-4cd9-9780-c53663438329
cris.virtualsource.orcid3dd0101d-ea52-4d2e-ba2a-b54570eb9d6e
cris.virtualsource.orcid052e01d3-a9e0-4b32-966f-8ecafe5ef49d
cris.virtualsource.orcid89a91aff-dba9-4deb-bc4c-d5206f2f4e17
cris.virtualsource.orciddd107ae4-7e5b-4146-a52c-2b865393d830
dc.contributor.authorKaczer, Ben
dc.contributor.authorDegraeve, Robin
dc.contributor.authorFranco, Jacopo
dc.contributor.authorGrasser, T.
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBury, Erik
dc.contributor.authorWeckx, Pieter
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorTyaginov, Stanislav
dc.contributor.authorVandemaele, Michiel
dc.contributor.authorGrill, Alexander
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorDiaz Fortuny, Javier
dc.contributor.authorSaraza Canflanca, Pablo
dc.contributor.authorWaltl, M.
dc.contributor.authorRinaudo, Pietro
dc.contributor.authorZhao, Ying
dc.contributor.authorKao, Ethan
dc.contributor.authorAsanovski, Ruben
dc.contributor.authorCatapano, Edoardo
dc.contributor.imecauthorKaczer, B.
dc.contributor.imecauthorDegraeve, R.
dc.contributor.imecauthorFranco, J.
dc.contributor.imecauthorRoussel, Ph J.
dc.contributor.imecauthorBury, E.
dc.contributor.imecauthorWeckx, P.
dc.contributor.imecauthorChasin, A.
dc.contributor.imecauthorTyaginov, S.
dc.contributor.imecauthorVanclemacle, M.
dc.contributor.imecauthorGrill, A.
dc.contributor.imecauthorO'Sullivan, B.
dc.contributor.imecauthorFortuny, J. Diaz
dc.contributor.imecauthorCanflanca, P. Saraza
dc.contributor.imecauthorRinaudo, P.
dc.contributor.imecauthorZhao, Y.
dc.contributor.imecauthorKao, E.
dc.contributor.imecauthorAsanovski, R.
dc.contributor.imecauthorCatapano, E.
dc.contributor.imecauthorBeckers, A.
dc.contributor.imecauthorVici, A.
dc.date.accessioned2024-10-27T16:53:00Z
dc.date.available2024-10-27T16:53:00Z
dc.date.issued2024
dc.identifier.doi10.1109/SNW63608.2024.10639245
dc.identifier.eisbn979-8-3503-9163-3
dc.identifier.isbn979-8-3503-9164-0
dc.identifier.issn2161-4636
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44693
dc.publisherIEEE
dc.source.beginpage3
dc.source.conferenceIEEE Silicon Nanoelectronics Workshop (SNW) / Symposium on VLSI Technology and Circuits
dc.source.conferencedate2024-06-15
dc.source.conferencelocationHonolulu
dc.source.endpage4
dc.source.numberofpages2
dc.title

Gate oxide reliability: upcoming trends, challenges, and opportunities

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions