Publication:

Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material

Date

2004
Proceedings Paper
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dc.contributor.authorTravaly, Youssef
dc.contributor.authorKemeling, N.
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorPeeters, S.
dc.contributor.authorTokei, Zsolt
dc.contributor.authorAbell, Thomas
dc.contributor.authorSchuhmacher, Jörg
dc.contributor.authorTurturro, S.
dc.contributor.authorVos, Ingrid
dc.contributor.authorEugene, Lino
dc.contributor.authorMatsuki, N.
dc.contributor.authorFukazawa, A.
dc.contributor.authorGoundar, K.
dc.contributor.authorSatoh, K.
dc.contributor.authorKato, M.
dc.contributor.authorKaneko, S.
dc.contributor.authorVertommen, Johan
dc.contributor.authorSprey, Hessel
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorJonas, A.
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T16:42:35Z
dc.date.available2021-10-15T16:42:35Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9689
dc.source.beginpage723
dc.source.conferenceAdvanced Metallization Conference 2003
dc.source.conferencedate21/10/2003
dc.source.conferencelocationMontreal/Tokyo
dc.source.endpage728
dc.title

Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material

dc.typeProceedings paper
dspace.entity.typePublication
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