Publication:

Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes

Date

2010
Journal article
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dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.date.accessioned2021-10-18T15:46:26Z
dc.date.available2021-10-18T15:46:26Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16935
dc.source.beginpage41302
dc.source.issue4
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume9
dc.title

Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes

dc.typeJournal article
dspace.entity.typePublication
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