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Chemical profiling with photoemission: a comparison between angle-resolved XPS and high-energy photoemission on full gate stacks
Publication:
Chemical profiling with photoemission: a comparison between angle-resolved XPS and high-energy photoemission on full gate stacks
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Conard, Thierry
;
Schram, Tom
;
Adelmann, Christoph
;
Woicik, J.
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Abstract
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1797
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Acq. date: 2025-12-15
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Metrics
Views
1797
since deposited on 2021-10-19
1
last month
Acq. date: 2025-12-15
Citations