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Chemical profiling with photoemission: a comparison between angle-resolved XPS and high-energy photoemission on full gate stacks

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dc.contributor.authorConard, Thierry
dc.contributor.authorSchram, Tom
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorWoicik, J.
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-19T12:54:22Z
dc.date.available2021-10-19T12:54:22Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18723
dc.source.conference4th International Workshop on Hard X-ray Photoelectron Spectroscopy - HAXPES
dc.source.conferencedate14/09/2011
dc.source.conferencelocationHamburg Germany
dc.title

Chemical profiling with photoemission: a comparison between angle-resolved XPS and high-energy photoemission on full gate stacks

dc.typeMeeting abstract
dspace.entity.typePublication
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