Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

dc.contributor.author	Nair, Vineet Vijayakrishnan
dc.contributor.author	Van Look, Lieve
dc.contributor.author	Aubert, Remko
dc.contributor.author	Hendrickx, Eric
dc.contributor.imecauthor	Nair, Vineet Vijayakrishnan
dc.contributor.imecauthor	Van Look, Lieve
dc.contributor.imecauthor	Aubert, Remko
dc.contributor.imecauthor	Hendrickx, Eric
dc.contributor.orcidimec	Nair, Vineet Vijayakrishnan::0000-0002-8970-2425
dc.date.accessioned	2022-01-05T11:29:23Z
dc.date.available	2021-11-02T16:03:40Z
dc.date.available	2022-01-05T11:29:23Z
dc.date.issued	2020
dc.identifier.doi	10.1117/12.2572993
dc.identifier.eisbn	978-1-5106-3843-3
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/38076
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference	Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	SEP 21-25, 2020
dc.source.conferencelocation	Monterey, CA, USA
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	11
dc.source.volume	11517
dc.title	Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry
dc.type	Proceedings paper
dspace.entity.type	Publication
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