Publication:

Orthogonal Array Pillar Process Development for High Density 4F2 Memory Cells at 40nm Pitch and Beyond

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2618761
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dc.contributor.authorPak, Murat
dc.contributor.authorZanders, Wesley
dc.contributor.authorWong, Patrick
dc.contributor.authorHalder, Sandip
dc.contributor.authorBlanc, Romuald
dc.contributor.authorSouriau, Laurent
dc.contributor.authorLee, Jeonghoon
dc.contributor.authorKar, Gouri Sankar
dc.contributor.imecauthorPak, Murat
dc.contributor.imecauthorZanders, Wesley
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorBlanc, Romuald
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorLee, Jeonghoon
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.accessioned2022-12-15T15:41:47Z
dc.date.available2022-09-19T02:51:14Z
dc.date.available2022-12-15T15:41:47Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2618761
dc.identifier.eisbn978-1-5106-4978-1
dc.identifier.isbn978-1-5106-4977-4
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40458
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120510J
dc.source.conferenceConference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages11
dc.source.volume12051
dc.title

Orthogonal Array Pillar Process Development for High Density 4F2 Memory Cells at 40nm Pitch and Beyond

dc.typeProceedings paper
dspace.entity.typePublication
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