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Photoresist characterization and wet strip after low-k dry etch
Publication:
Photoresist characterization and wet strip after low-k dry etch
Date
2008
Proceedings Paper
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15582.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Claes, Martine
;
Le, Quoc Toan
;
Keldermans, J.
;
Kesters, Els
;
Lux, Marcel
;
Franquet, Alexis
;
Vereecke, Guy
;
Mertens, Paul
;
Frank, Martin M.
;
Carleer, R.
;
Adriaensens, P.
;
Vanderzande, Dirk
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1875
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1875
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations