Publication:

Photoresist characterization and wet strip after low-k dry etch

Date

2008
Proceedings Paper
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Author(s)

Claes, Martine  
;
Le, Quoc Toan  
;
Keldermans, J.
;
Kesters, Els  
;
Lux, Marcel  
;
Franquet, Alexis  
;
Vereecke, Guy  
;
Mertens, Paul  
;
Frank, Martin M.
;
Carleer, R.
;
Adriaensens, P.
;
Vanderzande, Dirk  

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Abstract

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