Publication:

Photoresist characterization and wet strip after low-k dry etch

Date

2008
Proceedings Paper
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dc.contributor.authorClaes, Martine
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKeldermans, J.
dc.contributor.authorKesters, Els
dc.contributor.authorLux, Marcel
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorFrank, Martin M.
dc.contributor.authorCarleer, R.
dc.contributor.authorAdriaensens, P.
dc.contributor.authorVanderzande, Dirk
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVanderzande, Dirk
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-17T06:33:24Z
dc.date.available2021-10-17T06:33:24Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13530
dc.source.beginpage325
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage328
dc.title

Photoresist characterization and wet strip after low-k dry etch

dc.typeProceedings paper
dspace.entity.typePublication
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