Publication:

Gate stack preparation with high-k materials in a cluster tool

Date

2001
Proceedings Paper
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorConard, Thierry
dc.contributor.authorNohira, Hiroshi
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorMaes, Jos
dc.contributor.authorTuominen, Marko
dc.contributor.authorBajolet, Philippe
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-14T16:45:36Z
dc.date.available2021-10-14T16:45:36Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5190
dc.source.beginpage395
dc.source.conferenceProceedings of the IEEE International Symposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate8/10/2001
dc.source.conferencelocationSan Jose, CA USA
dc.source.endpage398
dc.title

Gate stack preparation with high-k materials in a cluster tool

dc.typeProceedings paper
dspace.entity.typePublication
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