Publication:
Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
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1871 since deposited on 2021-10-18
2last month
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Acq. date: 2026-05-20
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Statistics
Views
1871 since deposited on 2021-10-18
2last month
1last week
Acq. date: 2026-05-20
Citations