Publication:

Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers

Date

2010-09
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorLoo, Roger
dc.contributor.authorSouriau, Laurent
dc.contributor.authorOng, Patrick
dc.contributor.authorKenis, Karine
dc.contributor.authorRip, Jens
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorRip, Jens
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.date.accessioned2021-10-18T18:29:54Z
dc.date.available2021-10-18T18:29:54Z
dc.date.issued2010-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17527
dc.source.beginpage83
dc.source.conference10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate19/09/2010
dc.source.conferencelocationOostende Belgium
dc.source.endpage84
dc.title

Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions