Publication:
CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach
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1910 since deposited on 2021-10-16
Acq. date: 2025-10-22
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Views
1910 since deposited on 2021-10-16
Acq. date: 2025-10-22
Citations