Publication:

Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

Date

2018

Proceedings Paper

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Files

40690.pdf 1.59 MB

Author(s)

;

;

Hoppe, Wolfgang

;

Philipsen, Vicky

;

Melvin, Lawrence

;

Hendrickx, Eric

;

;

Kim, Ryan Ryoung han

Statistics

1994 since deposited on 2021-10-25

2last month

Acq. date: 2026-01-26