Publication:
Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
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1998 since deposited on 2021-10-25
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Acq. date: 2026-05-15
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Statistics
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1998 since deposited on 2021-10-25
2last month
1last week
Acq. date: 2026-05-15
Citations