Publication:

Multiple patterning: step by step towards 1X nm hp

Date

2010
Proceedings Paper
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dc.contributor.authorWiaux, Vincent
dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVersluijs, Janko
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-19T00:25:55Z
dc.date.available2021-10-19T00:25:55Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18350
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2010
dc.source.conferencelocationKobe Japan
dc.title

Multiple patterning: step by step towards 1X nm hp

dc.typeProceedings paper
dspace.entity.typePublication
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