Wafer alignment mark placement accuracy impact on the layer to layer overlay performance

dc.contributor.author	van Haren, Richard
dc.contributor.author	Steinert, Steffen
dc.contributor.author	Mouraille, Orion
dc.contributor.author	D'have, Koen
dc.contributor.author	Van Dijk, Leon
dc.contributor.author	Hermans, Jan
dc.contributor.author	Beyer, Dirk
dc.contributor.imecauthor	van Haren, Richard
dc.contributor.imecauthor	D'have, Koen
dc.contributor.imecauthor	Hermans, Jan
dc.contributor.orcidimec	D'have, Koen::0000-0002-5195-9241
dc.contributor.orcidimec	Hermans, Jan::0000-0003-1249-8902
dc.date.accessioned	2021-10-27T20:56:19Z
dc.date.available	2021-10-27T20:56:19Z
dc.date.issued	2019
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/34233
dc.identifier.url	https://doi.org/10.1117/12.2536270
dc.source.beginpage	1114811
dc.source.conference	Photomask Technology 2019
dc.source.conferencedate	15/09/2019
dc.source.conferencelocation	Monterey, CA USA
dc.title	Wafer alignment mark placement accuracy impact on the layer to layer overlay performance
dc.type	Proceedings paper
dspace.entity.type	Publication
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