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Articles
EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
Publication:
EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
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Date
2018
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40079.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bekaert, Joost
;
De Bisschop, Peter
;
Beral, Christophe
;
Hendrickx, Eric
;
van de Kerkhof, Mark A..
;
Bouten, Sander
;
Kupers, Michiel
;
Schiffelers, Guido
;
Verduijn, Erik
;
Brunner, Timothy
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1930
since deposited on 2021-10-25
Acq. date: 2025-12-11
Citations
Metrics
Views
1930
since deposited on 2021-10-25
Acq. date: 2025-12-11
Citations