EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction

dc.contributor.author	Bekaert, Joost
dc.contributor.author	De Bisschop, Peter
dc.contributor.author	Beral, Christophe
dc.contributor.author	Hendrickx, Eric
dc.contributor.author	van de Kerkhof, Mark A..
dc.contributor.author	Bouten, Sander
dc.contributor.author	Kupers, Michiel
dc.contributor.author	Schiffelers, Guido
dc.contributor.author	Verduijn, Erik
dc.contributor.author	Brunner, Timothy
dc.contributor.imecauthor	Bekaert, Joost
dc.contributor.imecauthor	De Bisschop, Peter
dc.contributor.imecauthor	Beral, Christophe
dc.contributor.imecauthor	Hendrickx, Eric
dc.contributor.imecauthor	Schiffelers, Guido
dc.contributor.imecauthor	Verduijn, Erik
dc.contributor.orcidimec	Bekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimec	Beral, Christophe::0000-0003-1356-9186
dc.date.accessioned	2021-10-25T16:41:51Z
dc.date.available	2021-10-25T16:41:51Z
dc.date.embargo	9999-12-31
dc.date.issued	2018
dc.identifier.issn	1932-5150
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/30226
dc.identifier.url	https://doi.org/10.1117/1.JMM.17.4.041013
dc.source.beginpage	41013
dc.source.issue	4
dc.source.journal	Journal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume	17
dc.title	EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
dc.type	Journal article
dspace.entity.type	Publication
Files	Original bundle Name: 40079.pdf Size: 8.31 MB Format: Adobe Portable Document Format Download
Publication available in collections:	Articles

Date