Publication:

Performance enhancement of Poly-Si/TiN/SiON based pMOSFETs by addition of an AlO capping layer

Date

2007
Journal article
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dc.contributor.authorSinganamalla, Raghunath
dc.contributor.authorYu, HongYu
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorPetry, Jasmine
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVolders, Henny
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorBiesemans, Serge
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.date.accessioned2021-10-16T19:49:57Z
dc.date.available2021-10-16T19:49:57Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12916
dc.source.beginpage1865
dc.source.endpage1868
dc.source.issue9_10
dc.source.journalMicroelectronic Engineering
dc.source.volume84
dc.title

Performance enhancement of Poly-Si/TiN/SiON based pMOSFETs by addition of an AlO capping layer

dc.typeJournal article
dspace.entity.typePublication
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